A few days ago, negotiable securities of the East China Sea is released grind the newspaper points out, photoetching glue says light sends resist again, it is a kind of relatively subtle to the light organic mixture, can use the chemical energy of smooth information translate into after actinic reaction will pass wave of diffractive, filter in photoetching system to measure, Zuo and the graphical move that gets on stencil of attack by surprise arrives on base. Photoetching craft is the important step in flow of treatment of accurate electron component, photoetching glue is the crucial material in process of electronic component treatment.
The basis uses a field, photoetching glue can be divided reach semiconductor photoetching glue to wait for glue of PCB photoetching glue, photoetching of indication face plate, apply extensively at showing the many fields such as news report of face plate, news and new energy resources, current, china is showing of face plate, smooth hot season, wind, 5G to wait for domain Yin model to all rank global front row.
Among them, the requirement that the fast of 5G technology extends half-and-half conductor material is formed bigger pull a movement to use, bring broad market space for photoetching glue. According to TECHCET data, dimensions of market of glue of global semiconductor photoetching rises to the 2.2 billion dollar 2021 by the 1.5 billion dollar 2016, compound increase rate is achieved 6.59% .
Camp of technology of semiconductor photoetching glue is highest, homebred change rate is low, rely on an entrance basically. Semiconductor photoetching glue includes G line, I line, KrF, ArF and EUV5 kind photoetching glue, downstream and main application is made at high-end brilliant circle. At present glue of photoetching of our country semiconductor originates basically abroad, glue of photoetching of current G line, I line is homebred change rate it is about 10% , krF and ArF photoetching glue are self-sufficient lead only 1% the left and right sides. Face the international environment with current wind tall urgent wave, semiconductor photoetching glue is homebred it is very important to change.
Breakthrough of high-end photoetching glue is first depend on raw material
Field of glue of global semiconductor photoetching is main by Japanese JSR, TOK, live friendly chemistry, letter jumps over chemistry of material of chemical, Fuji and American contented family name to wait for head firm forestall, abroad manufacturer masters the market of semiconductor photoetching glue of nearly 90% .
Among them, japanese JSR is the whole world the company of photoetching glue bibcock with the biggest, the leadest technology, market of glue of photoetching of its ArF high end has rate whole world the first, also be exclusive the business that capable quantity produces EUV photoetching rubber, glue of Japanese TOK photoetching is the G line with the biggest whole world / supplier of glue of photoetching of I line, KrF.
Level of technology of company of domestic photoetching rubber takes backward world first Zuo manufacturer, but in recent years domestic company accumulates to grind already obtained remarkable positive result. In industry of our country semiconductor, design basic already Zuo to enter the whole world downstream the first echelon formation, of glue of middle reaches photoetching make also had narrowed with global head manufacturer difference, and upriver material and abroad bibcock enterprise still enter the business outside backward Yu Hai; But technology of raw material of just upper reaches, having crucial effect to maintaining product competition ability.
Photoetching glue basically makes the agent, colophony that become film and additive by solvent, light (monomer etc auxiliary) wait for chemical composition to comprise, the different wavelengh that its comprise meeting ground light and fine tuning of travel of exposure source Zuo , decide in the light of of specific material surface affection specific photoetching glue raw material matchs .
Solvent content is occupied than highest, domestic self-sufficient rate is higher
Solvent is occupied in photoetching glue than highest, 50% arrive 90% between, because the smooth agent that bring and additive are solid state material, use dissolvent dissolves his form fluidity, besmears photoetching glue Fu is in equably surface of yuan of parts of an apparatus, rotate through low speed first in use process make photoetching glue is rolled out in electronic parts surface form even layer, repass high speed rotates swing redundant photoetching glue.
At present semiconductor and the dissolvent that glue of face plate photoetching uses basically are PGMEA (ester of acetic acid of aether of third thing mellow armour or PMA of ester of acid of second of aether of third thing mellow armour) , domestic self-sufficient rate is higher. Grind according to watching net data shows, 2015-2021 year armour aether industry produces alcohol of thing of our country third to rise can small, produce actually 2021 can achieve 450 thousand tons, crop achieves 375 thousand tons, demand is two hundred and sixty-five thousand eight hundred tons, wave motion of model of home market Yin rises, achieved 3.395 billion yuan 2021.
Proprietor of an enterprise of PGMEA overseas production should have divine harbor company of Basel of chemistry of chemistry of organic, 3 water chestnut, contented family name, Du Bang, Li Ande, domestic production proprietor of an enterprise should have Hua Lun chemistry of news of chemical industry, day, 100 plain He Yi amounts to chemistry to wait.
The smooth agent that bring is spent centrally tall, domestic company already achieved a breakthrough
The smooth agent that bring is occupied than be in 1% to 6% between, it is the core part of photoetching glue, basically use at production to make smooth solidify distribute product, its can produce actinic reaction below the optical radiation in specific wavelengh, change velar colophony thereby the solubility in developer solution. Smooth solidify technology is an energy-saving, clean environmental protection technology, resource conservation, opposite state environment has protective effect, won't discharge mephitis and thing oxidation carbon to the middle of atmosphere, because this is known as the new technology of industry of 21 centuries green.
Smooth solidify reaction is reaction of the group that leads solely, cross-linking substantially, below smooth illuminate, the smooth agent that bring absorbs the photon of specific wavelengh, produce freedom radical or cation, the monomer that bring and oligomer give birth to polymerization and cross-linking reaction, web shape writtens guarantee extremely high polymer polymer, Zuo and realize solidify.
Output of the smooth agent that bring grows China rapid, chinese sensitization learns data of statistic of committee of radiation solidify major to show, 2019 bring agent crop to be thirty-eight thousand four hundred tons respectively with light of 2020 year our country forty-five thousand four hundred tons, rose compared to the same period 18.23% . Among them D1173 and growth of 184 series output are remarkable.
The industry precedes raw material that light of current whole world makes agent industry be in the first echelon formation and Ai Jian of technical service business are unconscious (IGMResins) with domestic output the light with the biggest, the wholest breed brings agent to produce a supplier long day new material; thing echelon formation is Akema, Rahn AG, TCI Chemicals, hoist the sails new material and puissant the enterprise such as new material; The 3rd echelon formation is other in minor production company. Current, long day new material already had global force in smooth solidify domain.
The colophony that become film is abroad forestall, domestic company technology is broken through
The colophony that become film is occupied than be between 10%-40% , it is a kind of inert polymer matrix, its are used with collocation of the smooth agent that bring normally, it is the binder that is together other data group, it is the important part of action of sensitization of brandish of the in photoetching glue, decided exposure gloriole engraves the basic function of glue.
Wavelengh of photoetching craft exposure from G line / I line shortens laser of accurate element of KrF, ArF, arrive again EUV of ultraviolet light, the its corresponding colophony that become film also is exhibited from of phenolic aldehyde colophony contain hydroxyl, ester radical to wait base round polymer. Among them G line / glue of I line photoetching is given priority to with phenolic aldehyde colophony into velar colophony, phenolic aldehyde colophony is crucial to influence of photoetching glue function, ionic to metal of phenolic aldehyde resinous content asks to reach Ppb level.
Current, global photoetching glue is used into velar colophony main almost all by abroad forestall, main by live friendly chemistry, letter jumps over chemistry of family name of chemistry of chemical, 3 water chestnut, contented to wait for company production. At present photoetching glue uses face of of phenolic aldehyde colophony, the breakthrough is obtained on domestic company technology, home produces an enterprise to have holy spring group.
Design of red Cheng new material is produced can 5000 tons / year, going to try in resinous of glue of I line photoetching and be measured in Zuo at present produce, already finished TFT-LCD quantity of colophony of the phenolic aldehyde colophony of glue, phenolic aldehyde of LED photoetching glue is produced, downstream photoetching glue matchs performance assessment, colophony of glue of photoetching of liquid crystal face plate leaves and in try, relevant product is going in Zuo assessment of photoetching glue performance; 10 thousand embellish glue of 65 tons of photoetching uses project of phenolic aldehyde colophony already was started 2021, at present the product is in test and verify, predict implementation quantity is produced this year.
In the meantime, photoetching glue monomer is to synthesize velar resinous raw material, the quality of monomer decided to become the stability of velar colophony function, it is very important to because this is obtained,stabilize high grade monomer. But because semiconductor photoetching glue asks to compare other product to resinous taller, the synthetic technology difficulty of semiconductor class monomer is entered into prep above other and general monomer, demand of ionic to the metal in material content is little at 1ppb, prep above of monomer purity requirement 99.5% .
Although our country enterprise already achieved a breakthrough on the technology, but industrial is exhibited still put in greater difficulty. It is raw material above all less, product of domestic company colophony is most also the G line that is used at relatively low end and glue of I line photoetching, expect to the KrF of high-end market, ArF and EUV photoetching collagen, domestic manufacturer still has no maturity produce can.
It is time of client test and verify grows next, the user is agglutinant strong, the cycle of test and verify of client try out of the new product of photoetching glue is longer, want 18 months normally longer even, and the stability that produces fruit to maintain, the client won't change easily commonly photoetching glue product, because this home company is on the industry,implementation is exhibited it is a lot of and difficult to still need to take.
